http://www.eeel.nist.gov/812/conference/ Frontiers of Characterization and Metrology for Nanoelectronics March 27-29, 2007 Gaithersburg, Maryland National Institute of Standards and Technology (NIST) View the Conference Program! Confirmed speakers for the 2007 conference include: Yuji Awano, Fujitsu Laboratories Ltd., Atsugi, Japan Sanjay Banerjee, University of Texas at Austin, Austin, TX Chris Bevis, KLA-Tencor, San Jose, CA Dawn Bonnell, University of PA, Philadelphia, PA John Boland, Trinity College, Dubland, Ireland Michel Brillouett, CEA/LETI, Grenoble, France Jim Chelikowsky, University of Texas at Austin, Austin, TX Yannick De Wilde, CNRS, France Alain Diebold, SEMATECH, Austin, TX Mark Durcan, COO, Micron, Boise, ID Peter Eckland, Penn State, State College, PA Peter Ercius, Cornell, Ithaca, NY Mike Garner, Intel, Santa Clara, CA Michael Hecker, AMD, Dresden, Germany Dan Hutcheson, VLSI Research, Santa Clara, CA William A. Jeffrey, Director, NIST, Gaithersburg, MD David Joy, University of TN, Knoxville, TN Patrick Leduc, CEA/LETI, Grenoble, France Mark Lundstrom, Purdue, West Lafayette, IN Toshihiko Kanayama, AIST, Onogawa, Japan Tom Kelly, Imago, Madison, WI Stephen Knight, NIST, Gaithersburg, MD Kathryn Moler, Stanford University, Stanford, CA John Notte, ALIS, Peabody, MA Jimmy Price, SEMATECH, Austin, TX Tom Theis, IBM, Yorktown Heights, NY Anand Vairagar, AMD, Dresden, Germany Wilfried Vandervorst, IMEC, Leuven, Belgium Hisatsune Watanabe, President and CEO, Selete, Tsukuba, Japn Jeff Welser, SRC, Research Triangle Park, NC Caroline Whelan, IMEC, Leuven, Belgium Obert Wood, Advanced Micro Devices, Albany, NY Stefan Zollner, Freescale, Austin, TX The 2007 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled Characterization and Metrology for ULSI Technology) will be held in March 27-29, 2007 at the National Institute of Standards and Technology (NIST), Gaithersburg, Maryland. This conference, the sixth in the series, represents a paradigm shift from the previous conferences in that emphasis is on frontiers and innovation in characterization and metrology. Please check this site frequently, as more details will become available in the coming weeks. For more information on the proceedings of our most recent conference, please visit the American Institute of Physics (AIP). Committee Co-Chairs David Seiler, NIST Alain Diebold, SEMATECH Bob McDonald, METARA, INC. (Treasurer) Mike Garner, INTEL Dan Herr, SRC Rajinder Khosla, NSF Committee Members Caroline Ayre, Intel Alexander Braun, Semiconductor International Dick Brundle, C. R. Brundle and Associates Amal Chabli, LETI C. Rinn Cleavelin, Texas Instruments Michael Current, Frontier Semiconductor Dick Hockett, Evans Analytical Group LLC Toshihiko Kanayama, AIST Stephen Knight, NIST David Kyser, Applied Materials Shifeng Lu, Micron Ulrich Mantz, Zeiss Bob Mazur, Solid State Measurements Lori S. Nye, Entegris Sandip Tiwari, Cornell University Victor Vartanian, Freescale Wilfried Vandervorst, IMEC Bettina Weiss, SEMI Ehrenfried Zschech, AMD --

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