【免费国际研讨会】电浆蚀刻与沈积(Plasma Etching and Deposition) 国际研讨会~7/1清华大学开讲 活动介绍： Help engineers and scientists better understand fundamentals an d advances in Etch & Deposition processing （帮助工程师及科学研究人员更加了解蚀刻与沈积制程的原理与进展） 适合对象： Graduate students, post docs, professors, engineers, and staff have all found the material valuable in their research and development. The event is open to the local academic and technical communities and staff from start-ups to industry leaders participates. Often over 125 participants attend from multiple organizations and we have been honored to have some travel several hours to the workshop. （此研讨会开放给学校、技术研究单位或是当加入产业的员工，适合之对象为研 究生、博士後研究员、教授、工程师......。一般而言，会有超过125位参加人 员来自不同的组织或单位） 议程： 08:30-09:00 Registration 09:00-10:45 Talk1. Basics: Plasma and Reactors 10:45-11:00 Coffee Break 11:00-12:00 Talk2. Plasma Etching Mechanisms 12:00-13:00 Luncheon 13:00-15:00 Talk3. Dielectric Etching Compound Semiconductor Etching 15:00-15:15 Coffee Break 15:15-17:00 Talk4. Deep Silicon Etching PECVD and HDP CVD (high density plasma CVD) 演讲者介绍： David Lishan, Ph.D. Principal Scientist Plasma-Therm, LLC 专长： Plasma processing for R&D, MEMS, photonics, data storage, power, and compound semiconductor applications 举办日期：2014/07/01(周二)09:00-17:00，共7小时 举办地点：国立清华大学(新竹市光复路二段101号)　动力机械工程学系 工程一馆 108室 课程费用：全程免费 课程网站：http://edu.tcfst.org.tw/edm/03A363.asp 客服专线：03-5735521#3227 吕小姐 [email protected] 主办单位：Plasma-Therm LLC and Scientech Corporation 欢迎自行转载 ------------------------------------------------------------------------------ 充电会版位址如下： PTT→分组讨论区→生活娱乐馆→Life_Plan 人生→Refresh【充电板】─终身学习 ------------------------------------------------------------------------------ --

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